SPECTRO ARCOS – ICP-OES Analyzer

ARCOS

Features

The top-of-line SPECTRO ARCOS ICP-OES analyzer evolves elemental analysis to the next level

  • One instrument instead of two: Only MultiView plasma instrument in the market ‒ true axial AND true radial plasma observation in a single instrument
  • ORCA Optical System: Simultaneous spectrum capture in the 130-770 nm wavelength range with up to 5x more sensitivity than Echelle based systems - delivers best in class performance in the UV/VUV range
  • New dual side-on interface (DSOI) adds sensitivity and eliminates contamination/matrix compatibility issues
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Overview

The SPECTRO ARCOS inductively coupled plasma optical emission spectrometer (ICP-OES) excels in industrial and academic applications for the most advanced elemental analysis of metals, chemicals, petrochemicals, and other materials. The periscope-free MultiView mechanism lets an operator literally "turn" a radial-view instrument into an axial-view device, or vice-versa, in 90 seconds or less. MultiView now includes dual side-on plasma observation. The two optical interfaces add sensitivity and eliminate contamination/matrix compatibility issues. Line-array detectors, based on complementary metal-oxide-semiconductor (CMOS) technology, eliminates blooming, reads trace elements’ low signals even in the vicinity of intense matrix lines, offers a high dynamic range, and eliminates on-chip cooling. The design of the SPECTRO ARCOS ensures exceptionally low operating costs over a long, reliable service life. And it packs a modern, ergonomic chassis with proven features such as no-purge UV-PLUS sealed gas purification technology, proprietary air-cooling, optional intelligent valve system, and portable video camera for remote monitoring. The new SPECTRO ARCOS is available in six versions, depending on choices of plasma viewing technology and elemental wavelength range.

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